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IJAT Vol.11 No.5 pp. 691-698
doi: 10.20965/ijat.2017.p0691
(2017)

Paper:

Re-Evaluation of Calibration and Measurement Capabilities of Pitch Calibration Systems Designed by Using the Diffraction Method

Ichiko Misumi*,†, Jun-ichiro Kitta**, Ryosuke Kizu*, and Akiko Hirai*

*National Institute of Advanced Science and Technology (AIST)
AIST Tsukuba Central 3 Bldg., 1-1-1 Umezono, Tsukuba, Ibaraki 305-8563, Japan

Corresponding author

**Japan Quality Assurance Organization (JQA), Tokyo, Japan

Received:
November 21, 2016
Accepted:
July 4, 2017
Online released:
August 30, 2017
Published:
September 5, 2017
Keywords:
one-dimensional grating, optical diffraction method, grazing-incidence small-angle X-ray scattering (GI-SAXS), atomic force microscopy, calibration
Abstract

One-dimensional grating is one of the most important standards that are used to calibrate magnification of critical-dimension scanning electron microscopes (CD-SEMs) in the semiconductor industry. Long-term stability of pitch calibration systems is required for the competence of testing and calibration laboratories determined in ISO/IEC 17025:2005. In this study, calibration and measurement capabilities of two types of pitch calibration systems owned by a calibration laboratory are re-evaluated through comparison to a reference value and its expanded uncertainty given by a metrological atomic force microscope (metrological AFM) at National Metrology Institute of Japan (NMIJ), AIST. The calibration laboratory’s pitch calibration systems are designed by using the diffraction method (optical and X-ray).

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Last updated on Sep. 21, 2017