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IJAT Vol.3 No.1 pp. 84-88
doi: 10.20965/ijat.2009.p0084
(2009)

Paper:

A Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment

Jian-Shian Lin*,**, Chieh-Lung Lai*, Ya-Chun Tu*, Cheng-Hua Wu*, and Yoshimi Takeuchi**

*Mechanical and System Research Laboratories, Industrial Technology Research Institute
195 Chung Hsing Rd., Sec.4 Chu Tung, HsinChu, Taiwan 310, R.O.C.

**Department of Mechanical Engineering, Osaka University
2-1 Yamadaoka, Suita, Osaka 565-0871, Japan

Received:
September 17, 2008
Accepted:
November 6, 2008
Published:
January 5, 2009
Keywords:
nanoimprint, uniform pressure, lithography
Abstract

Nanoimprint lithography (NIL) has overcome the limitation of light diffraction. It is capable of printing features less than 10nm in size with high lithographic resolution, high manufacturing speed, and low production cost. The uniformity of pressure, however, remains a critical issue. To improve the uniformity of pressure, we developed a flexible uniform pressure component based on Pascal’s Law. When external force is applied to this component, uniform pressure is delivered to the mold and substrate. Average pressure over the embossed area using our improved nanoimprint equipment deviates by only 3.15%.

Cite this article as:
J. Lin, C. Lai, Y. Tu, C. Wu, and Y. Takeuchi, “A Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment,” Int. J. Automation Technol., Vol.3, No.1, pp. 84-88, 2009.
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Last updated on Nov. 08, 2019