A Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment
Jian-Shian Lin*,**, Chieh-Lung Lai*, Ya-Chun Tu*, Cheng-Hua Wu*, and Yoshimi Takeuchi**
*Mechanical and System Research Laboratories, Industrial Technology Research Institute
195 Chung Hsing Rd., Sec.4 Chu Tung, HsinChu, Taiwan 310, R.O.C.
**Department of Mechanical Engineering, Osaka University
2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
Nanoimprint lithography (NIL) has overcome the limitation of light diffraction. It is capable of printing features less than 10nm in size with high lithographic resolution, high manufacturing speed, and low production cost. The uniformity of pressure, however, remains a critical issue. To improve the uniformity of pressure, we developed a flexible uniform pressure component based on Pascal’s Law. When external force is applied to this component, uniform pressure is delivered to the mold and substrate. Average pressure over the embossed area using our improved nanoimprint equipment deviates by only 3.15%.
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