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JRM Vol.22 No.5 pp. 608-612
doi: 10.20965/jrm.2010.p0608
(2010)

Paper:

Development of Microfabrication Technology with Maskless Photolithography Device Using LCD Projector

Kazuyoshi Itoga, Jun Kobayashi, Masayuki Yamato,
and Teruo Okano

Institute of Advanced Biomedical Engineering and Science at TWIns, Tokyo Women’s Medical University, 8-1 Kawada-cho, Shinjuku-ku, Tokyo 162-8666, Japan

Received:
February 20, 2010
Accepted:
May 2, 2010
Published:
October 20, 2010
Keywords:
maskless, LCD projector, photolithography, photoresist, micropattern
Abstract

The maskless photolithography device we developed requires no photomask, by modifying Liquid Crystal Display (LCD) projector optics from magnified to reduced projection. The second-generation device we developed produces a practical centimeter-scale micropattern by dividing a large mask pattern and divisionally exposing it synchronized with an auto-XY stage, applying it to cellmicropattern and microfluidic device production. Although advantageous in producing maskless micropatterns, problems arise in jagged pattern boundaries due to the liquid crystal panel structure and collapse pattern of the boundary divided on divisional exposure using the auto-XY stage. The third-generation maskless photolithography device we developed had a more accurate auto-XY stage and solved problems caused by hardware through software such as control of the auto-XY stage.

Cite this article as:
Kazuyoshi Itoga, Jun Kobayashi, Masayuki Yamato, and
and Teruo Okano, “Development of Microfabrication Technology with Maskless Photolithography Device Using LCD Projector,” J. Robot. Mechatron., Vol.22, No.5, pp. 608-612, 2010.
Data files:
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