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IJAT Vol.10 No.5 pp. 786-793
doi: 10.20965/ijat.2016.p0786
(2016)

Paper:

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Development of New Complex Machining Technology for Single Crystal Silicon Carbide Polishing

Tsuneo Kurita†, Koji Miyake, Kenji Kawata, Kiwamu Ashida, and Tomohisa Kato

National Institute of Advanced Industrial Science and Technology (AIST)
AIST Tsukuba East, 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan

†Corresponding author

Received:
April 27, 2016
Accepted:
July 27, 2016
Published:
September 5, 2016
Creative Commons License
Keywords:
complex machining, silicon carbide, electrochemical machining, polishing
Abstract
Single-crystal, silicon carbide (SiC) wafers surpass silicon in terms of voltage resistance and heat resistance, and show promise for use in power semiconductor device applications. The aim of this research is to develop a complex machining technology for SiC, which is known to be difficult to process owing to its high hardness. This paper proposes a complex machining method based on converting SiC into a material with a relatively low hardness, and then polishing it using abrasive particles with a higher hardness. The proposed polishing method uses either a photodissociation or an electrochemical technique to reduce the hardness of SiC. The effectiveness of the combined technique is experimentally demonstrated. In addition, a method is proposed for monitoring the processing state by measuring the electric current.
Cite this article as:
T. Kurita, K. Miyake, K. Kawata, K. Ashida, and T. Kato, “Development of New Complex Machining Technology for Single Crystal Silicon Carbide Polishing,” Int. J. Automation Technol., Vol.10 No.5, pp. 786-793, 2016.
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