Paper:
Simulation of Dislocation Accumulation in Impurity Doped-ULSI Cells and Electric Characteristic Evaluations
Michihiro Sato*,† and Yosuke Takahashi**
*Department of Mechanical Engineering, Kitami Institute of Technology
165 Koen-cho, Kitami, Hokkaido 090-8507, Japan
†Corresponding author,
**UACJ Corporation
1-7-2 Otemachi, Chiyoda-ku, Tokyo 100-0004, Japan
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