Effects of Water Supply Using Ultrasonic Atomization on the Working Life of MCF Slurry in MCF Polishing
Mitsuyoshi Nomura*,, Naoya Makita*, Tatsuya Fujii*, and Yongbo Wu**
*Department of Mechanical Engineering, Akita Prefectural University
84-4 Aza Ebinokuchi, Tsuchiya, Yurihonjo City, Akita 015-0055, Japan
**Department of Mechanical and Energy Engineering, Southern University of Science and Technology, Shenzhen, China
The magnetic compound fluid (MCF) polishing process is a precision finishing method that has been applied to a large variety of materials, from soft optical polymers to hard ceramics. The purpose of this study is to extend the working life of MCF slurry. In this paper, we focus on the drying phenomenon of MCF slurry during polishing, and we develop a new water supply system that uses an ultrasonic atomization mechanism. This system can moisturize the MCF polishing area locally. Polishing experiments involving supplying water to MCF slurry are carried out, and extending the working life of MCF slurry is discussed.
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