Fabrication of Titanium-Based Hard Coatings by Atmospheric Microplasma-Metal Organic Chemical Vapor Deposition Using Titanium Tetraisopropoxide
Tsunehisa Suzuki*, Mutsuto Kato*, and Yoshiki Shimizu**
*Yamagata Research Institute of Technology, 2-2-1 Matsuei, Yamagata 990-2473, Japan
**National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8561, Japan
The atmospheric microplasma metal organic chemical vapor deposition (AP-MOCVD) using titanium (IV) tetraisopropoxide (TTIP) as a metal alkoxide titanium source was investigated for depositing TiC and TiN hard coatings on stainless steel rods for improving the tool life of electroplated diamond tools. The components and morphology of the coating deposited by microplasma AP-MOCVD with several gas sources and different processes was observed and analyzed. The titanium-based hard coatings composed of TiC, TiN, and TiO2 was successfully obtained by microplasma AP-MOCVD using TTIP as a metal alkoxide titanium source with mixed gases (CH4, N2, H2, and Ar). For the fabrication of titanium-based coatings (TiC, TiN) by microplasma AP-MOCVD, it is important that the carbon and oxygen content, which are components of TTIP, are reduced. The addition of hydrogen gas in the microplasma AP-MOCVD process, followed by nitriding effectively reduces the carbon and oxygen content in the coating.
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