Mold Pattern Fabrication by Nanoscratching
Jun Shimizu*, Libo Zhou*, Takeyuki Yamamoto*,
Hirotaka Ojima*, Teppei Onuki*, and Han Huang**
*Department of Intelligent Systems Engineering, Ibaraki University, 4-12-1 Nakanarusawa, Hitachi 316-8511, Japan
**School of Mechanical & Mining Engineering, The University of Queensland, Brisbane, QLD 4072, Australia
MEMS technologies for various nano/micro-devices often requires special facilities and complicated,multistage processes. The fabrication cost is thus extremely high. Consequently, alternative solutions have been sought, and NanoImprint Lithography (NIL) is one of the potential solutions. To date, the nano/micromolds for NIL are mainly fabricated using photolithography or focused ion beams. However, such beam methods generally make use of special instruments and require a long time to draw precise patterns. Thus, this study aims to fabricate nanoscale structures on monocrystalline silicon substrates using nanoscratching, which can potentially be used to fabricate nano/micro-molds for NIL. This paper discusses how various nano/micro-scale structures such as lineand-space, single-layer, and multiple-layer structures were fabricated on a silicon substrate using nanoscratching by an atomic force microscope equipped with a sharp probe made of monocrystalline diamond. Subsequent chemical etching was also conducted on the fabricated groove patterns to enlarge the depth of the fabricated groove patterns. The results confirmed that the groove was deepened several times, with only a slight increase in its width. A nanoimprint experiment was also carried out, and the line-and-space patterns were duplicated successfully on a polycarbonate resin film.
Hirotaka Ojima, Teppei Onuki, and Han Huang, “Mold Pattern Fabrication by Nanoscratching,” Int. J. Automation Technol., Vol.7, No.6, pp. 686-693, 2013.
-  S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Imprint of Sub-25 nm Vias and Trenches in Polymers,” Physical Review A, Vol.67, pp. 3114-3116, 1955.
-  K. Ashida, N. Morita, and Y. Yoshida, “Study on nano-machining process using mechanism of a friction force microscope,” JSME Int. J., Series C, Vol.44, pp. 244-253, 2001
-  J. W. Park, N. Kawasegi, N. Morita, and D. W. Lee, “Tribonanolithography of silicon in aqueous solution based on atomic force microscope,” Appl. Phys. Lett., Vol.85, pp. 1766-1768, 2004.
-  S. W. Youn and C. G. Kang, “Effect of nanoscratch conditions on both deformation behavior and wet-etching characteristics of silicon (100) surface,” Wear, Vol.261, pp. 328-337, 2006.
-  N. Kawasegi, N. Takano, D. Oka, N. Morita, S. Yamada, S. Takano, T. Obata, and K. Ashida, “Nanomachining of Silicon Surface Using Atomic Force Microscope With Diamond Tip,” Trans. ASME J. Man. Sci. and Eng., Vol.128, pp. 723-729, 2006.
-  X. Zhao and B. Bhushan, “Material removal mechanisms of singlecrystal silicon on nanoscale and at ultralow loads,” Wear, Vol.223, pp. 66-78, 1998.
-  M. Yoshino, T. Aoki, T. Shirakashi, and R. Komanduri, “Some experiments on the scratching of silicon: In situ scratching inside an SEM and scratching under high external hydrostatic pressures,” Int. J. of Mech. Sci., Vol.43, pp. 335-347, 2001.
-  Y. Q. Wu, H. Huang, J. Zou, and J. M. Dell, “Nanoscratch-induced deformation of single crystal silicon,” J. of Vac. Sci. & Technol. B, Vol.27, pp. 1374-1377, 2009.
-  N. Kawasegi and N. Morita, “High-Aspect-Ratio Structure Fabrication on (110)-Oriented Silicon Surfaces Using Tribo-Nanolithography,” J. of Nanosci. and Nanothech., Vol.10, pp. 2394-2400, 2010.
-  H. Seidel, L. Csepregi, A. Heuberger, H. Baumgartel, and J. Electrochem, “Anisotropic Etching of Crystalline Silicon in Alkaline Solutions,” J. of Electrochem. Soc., Vol.137, pp. 3612-3626, 1990.
-  D. L. Klein and D. J. D’Stefan, “Controlled Etching of Silicon in the HF-HNO3 System,” J. of Electrochem. Soc., Vol.109, pp. 37-42, 1962.
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