Development of Inspection Machine that Detect Small Particles Added on Surface with Precise Pattern by Capturing Backwards Scattered Polarized Light

Tsuyoshi Nomura; Tatsuo Nagasaki; Masami Ito

doi:10.20965/ijat.2012.p0781

single-au.php

« previous

IJAT Vol.6 No.6 pp. 781-791

doi: 10.20965/ijat.2012.p0781

(2012)

Development Report:

Views over last 60 days: 676

Development of Inspection Machine that Detect Small Particles Added on Surface with Precise Pattern by Capturing Backwards Scattered Polarized Light

Tsuyoshi Nomura, Tatsuo Nagasaki, and Masami Ito

Panasonic Corporation, 2-7 Matsuba-cho, Kadoma City, Osaka 571-8502, Japan

Received:

June 1, 2012

Accepted:

August 22, 2012

Published:

November 5, 2012

Keywords:

particle detection, laser diode, contaminant detection, automatic inspection, polarization

Abstract

The paper discusses the development of inspectionmachine to detect small particle by capturing backwards scattered polarized light. The proposed optical system consists of very low angle (2°) horizontal line laser light with S polarized characteristics and angle 150° backwards line CCD Camera to capture P polarized light from particles on wafer or glass and so on. This system is confirmed to apply the real production of wafer or glass.

Cite this article as:

T. Nomura, T. Nagasaki, and M. Ito, “Development of Inspection Machine that Detect Small Particles Added on Surface with Precise Pattern by Capturing Backwards Scattered Polarized Light,” Int. J. Automation Technol., Vol.6 No.6, pp. 781-791, 2012.

Data files:

References

[1] N. Akiyama, Y. Oshima, M. Koizumi, M. Akiba, and H. Nagatomo, “Automatic Inspection of Foreign Particles on Patterned Sample by Means of Polarized Laser,” SICE, Vol.17, No.2, pp. 237-242, 1981.
[2] M. Koizumi and N. Ayiyama, “Analysis of Light reflected from the Micro-Patterns on the Lsi Surfaces,” SICE, Vol.21, No.8, pp. 856-862, 1985.
[3] M. Koizumi and N. Akiyama, “Contaminant Detection Method Utilizing Polarization Characteristics of Light Reflected from Lsi Patterns,” SICE, Vol.25, No.9, pp. 954-961, 1989.
[4] N. Akiyama, “Contaminants Inspection Technology for Semiconductor Industry,” JSPE, Vol.55, No.2, pp. 294-298, 1989.
[5] A. Nakamura, N. Akiyama, T. Taniuchi, and S. Chikamatsu, “Development of Illumination system for Detection of Small Particles with High Illuminannce using Laser Diode,” JSPE, Vol.61, No.12, pp. 1730-1734, 1995.
[6] N. Akiyama, Y. Maruyama, M. Yoshida, Y. Yatsugake, “Simulation of Light Scattered by Particles on Silicon Wafer Deposited with Sio2 Thin Film,” JSPE, Vol.67, No.10, pp. 1642-1646, 2001.
[7] N. Akiyama, T. Suzuki, K. Kawata, and M. Yoshida, “Detection of Light Scattered by Particles on Silicon Wafer with Sio2 Thin Film,” JSPE, Vol.68, No.4, pp. 531-535, 2002.
[8] N. Akiyama, F. Mizuno, M. Ikota, and K. Takami, “Particle Detection Technology on Wafer Using Spatial Filter,” JSPE, Vol.58, No.11, pp. 1909-1914, 1992.
[9] N. Akiyama, T. Nakata, H. Makihira etc., “Development of Particle Detection System using Subtracted Image Signal,” JSPE, Vol.57, No.11, pp. 1955-1960, 1991.
[10] A. Nakamura, N. Akiyama, T. Yachi, and S. Chikamatsu, “Detection of Small Particles on TFT-LCD Using Comparison Method along Scanning Direction of Image Sensor,” JSPE, Vol.61, No.6, pp. 864-868, 1995.
[11] M. Born and E. Wolf, “Principles of Optics,” Oxford PERGAMON PRESS, 1975.

This article is published under a Creative Commons Attribution-NoDerivatives 4.0 Internationa License.

[1] [1] N. Akiyama, Y. Oshima, M. Koizumi, M. Akiba, and H. Nagatomo, “Automatic Inspection of Foreign Particles on Patterned Sample by Means of Polarized Laser,” SICE, Vol.17, No.2, pp. 237-242, 1981.

[2] [2] M. Koizumi and N. Ayiyama, “Analysis of Light reflected from the Micro-Patterns on the Lsi Surfaces,” SICE, Vol.21, No.8, pp. 856-862, 1985.

[3] [3] M. Koizumi and N. Akiyama, “Contaminant Detection Method Utilizing Polarization Characteristics of Light Reflected from Lsi Patterns,” SICE, Vol.25, No.9, pp. 954-961, 1989.

[4] [4] N. Akiyama, “Contaminants Inspection Technology for Semiconductor Industry,” JSPE, Vol.55, No.2, pp. 294-298, 1989.

[5] [5] A. Nakamura, N. Akiyama, T. Taniuchi, and S. Chikamatsu, “Development of Illumination system for Detection of Small Particles with High Illuminannce using Laser Diode,” JSPE, Vol.61, No.12, pp. 1730-1734, 1995.

[6] [6] N. Akiyama, Y. Maruyama, M. Yoshida, Y. Yatsugake, “Simulation of Light Scattered by Particles on Silicon Wafer Deposited with Sio2 Thin Film,” JSPE, Vol.67, No.10, pp. 1642-1646, 2001.

[7] [7] N. Akiyama, T. Suzuki, K. Kawata, and M. Yoshida, “Detection of Light Scattered by Particles on Silicon Wafer with Sio2 Thin Film,” JSPE, Vol.68, No.4, pp. 531-535, 2002.

[8] [8] N. Akiyama, F. Mizuno, M. Ikota, and K. Takami, “Particle Detection Technology on Wafer Using Spatial Filter,” JSPE, Vol.58, No.11, pp. 1909-1914, 1992.

[9] [9] N. Akiyama, T. Nakata, H. Makihira etc., “Development of Particle Detection System using Subtracted Image Signal,” JSPE, Vol.57, No.11, pp. 1955-1960, 1991.

[10] [10] A. Nakamura, N. Akiyama, T. Yachi, and S. Chikamatsu, “Detection of Small Particles on TFT-LCD Using Comparison Method along Scanning Direction of Image Sensor,” JSPE, Vol.61, No.6, pp. 864-868, 1995.

[11] [11] M. Born and E. Wolf, “Principles of Optics,” Oxford PERGAMON PRESS, 1975.