Realization of Tubeless Stage in Semiconductor Exposure System
Next Generation Project Section, Development Headquarters, Precision Equipment Company, Nikon Corporation
We realized super fine positioning of the stage which is applied for the step and scan lithography apparatus using the following technologies. – Direct drive concept (not using “fine and coarse” stage configuration) – Newly developed air-bearing without moving tube for air supply. – Simple and light weight configuration – 3DOF (X Y Tz) counter-mass – Compensation of motor force ripple – Symmetry structure and driving at center of gravity
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