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IJAT Vol.2 No.2 pp. 119-123
doi: 10.20965/ijat.2008.p0119
(2008)

Paper:

Realization of Tubeless Stage in Semiconductor Exposure System

Yuichi Shibazaki

Next Generation Project Section, Development Headquarters, Precision Equipment Company, Nikon Corporation

Received:
September 3, 2007
Accepted:
January 22, 2008
Published:
March 5, 2008
Keywords:
positioning, air-bearing, counter-mass, symmetry, center of gravity
Abstract

We realized super fine positioning of the stage which is applied for the step and scan lithography apparatus using the following technologies. – Direct drive concept (not using “fine and coarse” stage configuration) – Newly developed air-bearing without moving tube for air supply. – Simple and light weight configuration – 3DOF (X Y Tz) counter-mass – Compensation of motor force ripple – Symmetry structure and driving at center of gravity

Cite this article as:
Yuichi Shibazaki, “Realization of Tubeless Stage in Semiconductor Exposure System,” Int. J. Automation Technol., Vol.2, No.2, pp. 119-123, 2008.
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