IJAT Vol.2 No.2 pp. 119-123
doi: 10.20965/ijat.2008.p0119


Realization of Tubeless Stage in Semiconductor Exposure System

Yuichi Shibazaki

Next Generation Project Section, Development Headquarters, Precision Equipment Company, Nikon Corporation

September 3, 2007
January 22, 2008
March 5, 2008
positioning, air-bearing, counter-mass, symmetry, center of gravity
We realized super fine positioning of the stage which is applied for the step and scan lithography apparatus using the following technologies. - Direct drive concept (not using "fine and coarse" stage configuration) - Newly developed air-bearing without moving tube for air supply. - Simple and light weight configuration - 3DOF (X Y Tz) counter-mass - Compensation of motor force ripple - Symmetry structure and driving at center of gravity
Cite this article as:
Y. Shibazaki, “Realization of Tubeless Stage in Semiconductor Exposure System,” Int. J. Automation Technol., Vol.2 No.2, pp. 119-123, 2008.
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