Femtosecond Pulsed Laser Deposition of Graphite on Silicon and Copper Foil
Mary Ann Calleja, Annaliza Amo, Jessa Jayne Miranda,
Floyd Willis Patricio, and Wilson Garcia
Photonics Research Laboratory, National Institute of Physics, University of the Philippines, Diliman 1101, Quezon City, Philippines
We deposited graphite on silicon (111) and copper foil substrate through femtosecond pulsed laser deposition (fs-PLD). A high purity graphite target was placed inside a vacuum chamber at a base pressure of 10-2 mbar. The deposition time was varied for 3 hours, 4 hours and 5 hours. XRD spectra showed a (110) peak indicating an oriented growth for samples deposited on silicon (111) and copper foil substrates. AFM topographical images of the samples deposited on silicon (111) showed flake-like structures. However, samples deposited on copper foil showed the presence of defects and lack of deposited particles.
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