IJAT Vol.9 No.6 pp. 612-618
doi: 10.20965/ijat.2015.p0612


Fabrication Process of Antimony Telluride and Bismuth Telluride Micro Thermoelectric Generator

Mizue Mizoshiri*, Masashi Mikami**, and Kimihiro Ozaki**

*Graduate School of Engineering, Nagoya University
Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603, Japan

**National Institute of Advanced Industrial Science and Technology
2266-98 Anagahora, Moriyama-ku, Nagoya, Aichi 463-8560, Japan

June 4, 2015
October 1, 2015
November 5, 2015
micro thermoelectric generator, bismuth-telluride film, sputtering, lithography, lift-off process
This paper describes the process of fabricating micro thermoelectric generators (μ-TEGs) based on antimony telluride (Sb-Te) and bismuth telluride (Bi-Te). These materials have excellent thermoelectric (TE) conversion properties. The deposition and patterning processes for thermoelectric films are key techniques in the fabrication of μ-TEGs. However, it is difficult to form TE micropatterns using conventional semiconductor technologies because Sb-Te and Bi-Te are brittle and difficult to etch. Therefore, a semiconductor fabrication process is developed for TE film patterning. Here, various processes for depositing Sb-Te and Bi-Te TE films are described. Then, the combinations of the deposition and patterning techniques are reviewed. Finally, the generation properties of the μ-TEGs are summarized.
Cite this article as:
M. Mizoshiri, M. Mikami, and K. Ozaki, “Fabrication Process of Antimony Telluride and Bismuth Telluride Micro Thermoelectric Generator,” Int. J. Automation Technol., Vol.9 No.6, pp. 612-618, 2015.
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Last updated on Jul. 19, 2024